Synthetic Graphite for Semiconductor Industry

We produce and supply high quality processed synthetic graphite products for application of semiconductor industry. We have several CNC machining centers with high revolutions to ensure mechanical tolerance, and we have three coordinate measuring instruments, which can check the tolerance of processed work pieces to ensure the measurable quality. At the same, we have the state of the art purification furnaces, which can purify the processed products to ash content less than 2PPM.

Carbon & Graphite Products For Hot Zone

Components used in semiconductor environment have high requirements for particle size. It not only needs the good physical properties of graphite materials, such as high temperature resistance, corrosion resistance and plasma resistance, but also high requirements for the purity and machining accuracy of graphite.

We use imported purification equipment of international well-known brands, which can extract the purity of graphite processed parts to 5-50PPM, and the ash content of specially ordered products can be less than 2PPM.

Specifications of Synthetic Graphite Materials:

Grade	Bulk Density	Specific Resistance	Flexural Strength	Compressive Strength	Ash (Normal)	Ash (purified)	Grain Size
Grade	g/cm³	μΩ.m	MPa	MPa	%	ppm	μm
IS-11	1.83	11~13	50	115	0.05	50	8~10
IS-12	1.90	11~13	61	135	0.05	50	8~10
IS-13	1.78	≤13	46	86	0.05	50	–
IS-14	1.86	11~12	65	135	0.05	50	5
IS-22	1.80	13~14	55	100	0.02	–	8
IS-23	1.86	9~12	55	110	0.05	–	13
IS-31	1.79	11-13	38	78	0.05	–	–
IS-32	1.85	11-13	45	100	0.05	–	–

Note: These are reference data, not guaranteed data.

Applications: graphite thermal field in semi-con single crystal furnace, including heating element, crucible, insulation cylinder, packaging fixture, etc.